Rapid area deactivation for blocking atomic layer deposition processes using polystyrene brush layers

Blocking the lateral film growth at the nanoscale in area-selective atomic layer deposition.

Area-selective atomic layer deposition (ALD) allows the growth of highly uniform thin inorganic films on certain parts of the substrate while preventing the film growth on other parts. Although the selective ALD growth is working well at the micron and submicron scale, it has failed at the nanoscale, especially near the interface where there is growth on one side and no-growth on the other side...

Reaction Path Analysis for Atomic Layer Deposition Processes

In this paper, we examine the mathematical structure of thin-film deposition process reaction kinetics models with the goal of determining whether a reaction network can guarantee the self-limiting and stable growth inherent in true atomic layer deposition systems. This analysis is based on identifying reaction invariants and interpreting the chemical significance of these conserved modes. A sp...

Atomic layer deposition: an overview.

Atomic Layer Deposition of TiO

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Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

Printer for Local Area Activation Alfredo Mameli,*,† Yinghuan Kuang,† Morteza Aghaee,† Chaitanya K. Ande,† Bora Karasulu,† Mariadriana Creatore,† Adriaan J. M. Mackus,† Wilhelmus M. M. Kessels,† and Fred Roozeboom†,‡ †Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands ‡Department Thin Film Technology, TNO, High Tech Campus 21, 5656 ...